The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Dec. 29, 2022
Menglei Chai, Los Angeles, CA (US);
Riza Alp Guler, London, GB;
Yash Mukund Kant, Toronto, CA;
Jian Ren, Hermosa Beach, CA (US);
Aliaksandr Siarohin, Los Angeles, CA (US);
Sergey Tulyakov, Santa Monica, CA (US);
Menglei Chai, Los Angeles, CA (US);
Riza Alp Guler, London, GB;
Yash Mukund Kant, Toronto, CA;
Jian Ren, Hermosa Beach, CA (US);
Aliaksandr Siarohin, Los Angeles, CA (US);
Sergey Tulyakov, Santa Monica, CA (US);
Snap Inc., Santa Monica, CA (US);
Abstract
Invertible Neural Networks (INNs) are used to build an Invertible Neural Skinning (INS) pipeline for reposing characters during animation. A Pose-conditioned Invertible Network (PIN) is built to learn pose-conditioned deformations. The end-to-end Invertible Neural Skinning (INS) pipeline is produced by placing two PINs around a differentiable Linear Blend Skinning (LBS) module using a pose-free canonical representation. The PINs help capture the non-linear surface deformations of clothes across poses and alleviate the volume loss suffered from the LBS operation. Since the canonical representation remains pose-free, the expensive mesh extraction is performed exactly once, and the mesh is reposed by warping it with the learned LBS during an inverse pass through the INS pipeline.