The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

Jan. 10, 2025
Applicant:

Citibank, N.a., New York, NY (US);

Inventors:

Maneet Sharma, New York, NY (US);

Adar K. Danait, New York, NY (US);

Flora P. Sah, New York, NY (US);

Krishnendu Chatterjee, New York, NY (US);

Rama Koteswara Rao Kandimalla, New York, NY (US);

Pavithra Araleri Visweswariah, New York, NY (US);

Djona Fegnem, New York, NY (US);

Swati Mittal, New York, NY (US);

Paul Joseph Zakharia, New York, NY (US);

Paul Edward Hibbs, New York, NY (US);

James Michael Iacona, New York, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 40/20 (2020.01); G06F 21/57 (2013.01);
U.S. Cl.
CPC ...
G06F 40/20 (2020.01); G06F 21/577 (2013.01);
Abstract

Methods and descriptions are described herein for applying cascading machine learning models to command prompts. In particular, the system may receive a query indicating a computing process to be performed. The system may input a command prompt based on the query into a first instance of an LLM, which may output activities for performing the process. The system may input a first activity into a second instance of the LLM, which may output vulnerabilities associated with the first activity. The system may input a first vulnerability into a third instance of the LLM, which may output indications of available control tools for addressing the first vulnerability. The system may input a first control tool into a fourth instance of the LLM, which may output indications of monitoring tools for monitoring the first control tool. The system may then cause implementation of the first control tool and the first monitoring tool.


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