The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

Aug. 09, 2021
Applicant:

Emc Ip Holding Company Llc, Hopkinton, MA (US);

Inventors:

Zijia Wang, WeiFang, CN;

Jiacheng Ni, Shanghai, CN;

Wenbin Yang, Shanghai, CN;

Zhen Jia, Shanghai, CN;

Assignee:

EMC IP Holding Company LLC, Hopkinton, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/16 (2006.01); G06F 18/213 (2023.01); G06F 18/214 (2023.01);
U.S. Cl.
CPC ...
G06F 18/214 (2023.01); G06F 17/16 (2013.01); G06F 18/213 (2023.01);
Abstract

Embodiments disclosed herein include a method, an electronic device, and a computer program product for data processing. The method includes determining a first set of feature vectors representing samples in a data set. The method also includes generating a second set of feature vectors by performing a first transformation on the first set of feature vectors, wherein distribution skewness of the second set of feature vectors in a feature space is smaller than that of the first set of feature vectors. The method also includes generating a third set of feature vectors by performing a second transformation on the second set of feature vectors, wherein the third set of feature vectors and the second set of feature vectors have different distances between vectors. The method also includes selecting target samples as representatives from the samples based on a distribution of the third set of feature vectors in the feature space.


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