The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

Mar. 15, 2024
Applicant:

Cirque Corporation, Sandy, UT (US);

Inventors:

Ninad Sathe, Sunnyvale, CA (US);

Ilya Daniel Rosenberg, Sunnyvale, CA (US);

Kirsten Etzold, Sunnyvale, CA (US);

Assignee:

Cirque Corporation, Sandy, UT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/01 (2006.01); G06F 3/041 (2006.01); G06F 3/044 (2006.01);
U.S. Cl.
CPC ...
G06F 3/04146 (2019.05); G06F 3/04166 (2019.05); G06F 3/0445 (2019.05); G06F 3/0447 (2019.05); G06F 2203/04105 (2013.01);
Abstract

A system includes: a substrate; a first electrode proximal a center on the substrate; and a second electrode interposed between the first electrode and an edge on the substrate. The system also includes a first coupling region: arranged on a first planar region of the baseplate; offset from the first electrode by a first height; and coupling to the first electrode to yield a first electrical value at the first electrode responsive to application of a force magnitude proximal the center. The system further includes a second coupling region: arranged on a second planar region, offset above the first planar region, of the baseplate; offset from the second electrode by a second height, less than the first nominal gap height; and coupling to the second electrode to yield a second electrical value, approximating the first electrical value, at the second electrode responsive to application of the force magnitude.


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