The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Feb. 03, 2022
Microsoft Technology Licensing, Llc, Redmond, WA (US);
Bernard Charles Kress, Redwood City, CA (US);
Ishan Chatterjee, Seattle, WA (US);
Joel Steven Kollin, Seattle, WA (US);
Maria Esther Pace, Palo Alto, CA (US);
Microsoft Technology Licensing, LLC, Redmond, WA (US);
Abstract
Slanted surface relief gratings for use in an optical display system in an HMD device are replicated in a manufacturing process that utilizes non-contact optical proximity recording into a specialized photo-sensitive resin that is disposed over a waveguide substrate. The recording process comprises selective resin exposure to ultraviolet light through a mask to spatially record grating structures by interferential exposure and polymerization. Subsequent resin development evacuates unexposed resin down to the waveguide substrate to remove flat surfaces, referred to as a bias layer, that remain in the grating trenches after exposure. The resin development reduces Fresnel reflections that could otherwise be induced at the media interface between the bias layer and the waveguide substrate. Fresnel reflections may cause a loss of diffraction efficiency and thereby reduce the field of view that may be guided by the SRGs in the optical display system.