The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

Nov. 16, 2020
Applicant:

Nike, Inc., Beaverton, OR (US);

Inventors:

Josue Diaz, Portland, OR (US);

Andrea J. Staub, Portland, OR (US);

Michael Tanios, Portland, OR (US);

Assignee:

NIKE, Inc., Beaverton, OR (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D04H 3/05 (2006.01); A41D 27/28 (2006.01); A41D 31/00 (2019.01); A41D 31/102 (2019.01); A41D 31/12 (2019.01); D04H 3/005 (2012.01); D04B 1/10 (2006.01); D04B 1/24 (2006.01); D04B 9/38 (2006.01); D04B 11/36 (2006.01); D04B 21/20 (2006.01);
U.S. Cl.
CPC ...
D04H 3/05 (2013.01); A41D 27/28 (2013.01); A41D 31/00 (2013.01); A41D 31/102 (2019.02); A41D 31/12 (2019.02); D04H 3/005 (2013.01); A41D 2500/10 (2013.01); D04B 1/104 (2013.01); D04B 1/24 (2013.01); D04B 9/38 (2013.01); D04B 11/36 (2013.01); D04B 21/207 (2013.01);
Abstract

Knit apparel formed using knitted structures and yarn content to create zonal properties provided. In aspects, garments, such as lower-body garments, have gradient missed-stitch structures creating protrusions on the external surface of the garment. Each gradient missed-stitch structure has at least a first missed-stitch segment and a second missed-stitch segment. The first missed-stitch segment is formed by a first set of float stitches along a first plurality of courses, and the second missed-stitch segment is formed by a second set of float stitches along a subset of the first plurality of courses. There may be additional missed-stitch segments formed across different quantities of courses such that the gradient missed-stitch structures are each tapered.


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