The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

Nov. 07, 2024
Applicant:

Southeast University, Jiangsu, CN;

Inventors:

Xuhai Zhang, Nanjing, CN;

Tongheng Wang, Nanjing, CN;

Yuqiao Zeng, Nanjing, CN;

Peng Cui, Nanjing, CN;

Chongyang Ba, Nanjing, CN;

Feng Fang, Nanjing, CN;

Qiyue Shao, Nanjing, CN;

Haoran Zheng, Nanjing, CN;

Pengcheng Zhao, Nanjing, CN;

Jianqing Jiang, Nanjing, CN;

Assignee:

SOUTHEAST UNIVERSITY, Nanjing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C22C 30/02 (2006.01); C25B 11/031 (2021.01); C25B 11/089 (2021.01); C25D 3/56 (2006.01); C25D 5/00 (2006.01); C25D 5/48 (2006.01);
U.S. Cl.
CPC ...
C22C 30/02 (2013.01); C25B 11/031 (2021.01); C25B 11/089 (2021.01); C25D 3/56 (2013.01); C25D 5/48 (2013.01); C25D 5/623 (2020.08);
Abstract

Six-membered high-entropy foam for hydrogen production by water splitting and preparation method are provided. The foam consists of Ni, Fe, Cu, Co, Mo, and Pt, comprising 10 at %-25 at % of Ni, 10 at %-25 at % of Fe, 10 at %-25 at % of Cu, 10 at %-25 at % of Co, 10 at %-25 at % of Mo, and 10 at %-25 at % of Pt. Catalyst loading of the foam can reach a range of 0.8 mg/cm-3.2 mg/cm, which is much higher than the effective catalyst loading of most nano-catalysts. When used as catalyst for hydrogen production by water splitting, the hydrogen evolution overpotential of the surface of the six-membered high-entropy foam is within a range of 36 mV-60 mV, and the foam operates stably at industrial-level current density (500 mA/cm). The preparation method does not require harsh environment such as high temperature or high vacuum, making the method simple and easy to implement, with low-cost raw materials.


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