The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

Jan. 25, 2019
Applicant:

Toray Industries, Inc., Tokyo, JP;

Inventors:

Taisuke Kogawa, Otsu, JP;

Masaki Fujita, Otsu, JP;

Yuichi Koyamatsu, Otsu, JP;

Kazuhiro Tanahashi, Otsu, JP;

Kazuyuki Kidoba, Otsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 81/00 (2006.01); A61L 24/04 (2006.01); C09D 171/02 (2006.01);
U.S. Cl.
CPC ...
C08G 81/00 (2013.01); A61L 24/046 (2013.01); C09D 171/02 (2013.01); C08G 2150/00 (2013.01);
Abstract

A biodegradable block copolymer has high conformability and excellent degradability. The block copolymer including a polyalkylene glycol block and a polyhydroxyalkanoic acid block, wherein the mass ratio of the polyalkylene glycol block with respect to the total mass is 10 to 60%; the carbonyl carbon has a carbon nuclear relaxation time T1ρ of not more than 20 ms; and the block copolymer satisfies Equation (1): χ=χ1×χ2>20 (1) χ1: crystallization rate of the polyalkylene glycol block; χ2: crystallization rate of a poly-A block, wherein A represents, among the repeat units contained in the polyhydroxyalkanoic acid block, a repeat unit whose homopolymer composed of the same repeat units has a highest crystallization rate.


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