The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

Nov. 25, 2021
Applicant:

SK Pucore Co., Ltd., Ulsan, KR;

Inventors:

Jae Young Pai, Gyeonggi-do, KR;

Jeong Moo Kim, Gyeonggi-do, KR;

Hyuk Hee Han, Gyeonggi-do, KR;

Jung Hwan Myung, Gyeonggi-do, KR;

Kyeong Hwan You, Gyeonggi-do, KR;

Joo Young Jung, Gyeonggi-do, KR;

Myung Ok Kyun, Gyeonggi-do, KR;

Ji Yeon Ryu, Gyeonggi-do, KR;

Assignee:

SK pucore co., ltd., Ulsan, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 18/38 (2006.01); C07C 321/14 (2006.01); C08G 18/76 (2006.01); G02B 1/04 (2006.01);
U.S. Cl.
CPC ...
C08G 18/3876 (2013.01); C07C 321/14 (2013.01); C08G 18/387 (2013.01); C08G 18/7642 (2013.01); G02B 1/041 (2013.01);
Abstract

A polythiol composition according to exemplary embodiments includes a first polythiol compound which provides a maximum peak in a high performance liquid chromatography (HPLC) analysis graph obtained at a wavelength of 230 nm, and a second polythiol compound having a molecular weight greater than that of the first polythiol compound and represented by CHS. A ratio of a peak area of the second polythiol compound to a peak area of the first polythiol compound, which are measured through the HPLC analysis graph at the wavelength of 230 nm, is 0.05 to 5.0%.


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