The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Jun. 28, 2020
Applicants:
Research Institute of Tsinghua University IN Shenzhen, Guangdong, CN;
Tsinghua University, Beijing, CN;
Inventors:
Assignees:
RESEARCH INSTITUTE OF TSINGHUA UNIVERSITY IN SHENZHEN, Guangdong, CN;
TSINGHUA UNIVERSITY, Beijing, CN;
Primary Examiner:
Int. Cl.
CPC ...
B81C 1/00 (2006.01); B81B 5/00 (2006.01); C01B 32/00 (2017.01); C01B 32/20 (2017.01);
U.S. Cl.
CPC ...
B81C 1/00198 (2013.01); B81B 5/00 (2013.01); B81C 1/00 (2013.01); B81C 1/00206 (2013.01); C01B 32/00 (2017.08); C01B 32/20 (2017.08);
Abstract
Provided is a manufacturing method for graphite slider arrays in batches. In this method, a grain structures examination step is added to a process of manufacturing graphite slider arrays, and a subsequent etching step is controlled so that only one horizontal grain boundary exists inside the graphite mesas, and when cleaved, the sliders slide away on the only grain boundary. The slider arrays prepared by this method have uniform easy-slip surfaces and thickness with good consistency.