The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

May. 14, 2020
Applicant:

Uab Altechna R&d, Vilnius, LT;

Inventors:

Mindaugas Mikutis, Vilnius, LT;

Orestas Ulcinas, Vilnius, LT;

Titas Gertus, Vilnius, LT;

Antanas Urbas, Vilnius, LT;

Assignee:

UAB ALTECHNA R&D, Vilnius, LT;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/0622 (2014.01); B23K 26/046 (2014.01); B23K 26/06 (2014.01); B23K 26/38 (2014.01); B23K 26/53 (2014.01); B23K 103/00 (2006.01);
U.S. Cl.
CPC ...
B23K 26/0624 (2015.10); B23K 26/046 (2013.01); B23K 26/0648 (2013.01); B23K 26/38 (2013.01); B23K 26/53 (2015.10); B23K 2103/54 (2018.08);
Abstract

The invention is related to fabrication of transparent materials by means of ultra-short laser pulses. Method to fabricate materials transparent in most part to laser wavelength comprises forming non-centrosymmetric, non-diffracting beam by optical element that contains at least two zones of birefringent structures changing Pancharatnam-Berry Phase according to the rule specific for that particular zone. The distribution of energy, phase and polarization depends on parameters of light approaching said element. Pulse energy is selected to employ main maximum of distribution to form voids elongated in desired direction while side maxima form changes of chemical character between damages from adjacent pulses. Void damages and zones of chemical changes form desired cut line. The workpiece prepared in said manner is placed in chemically aggressive solution, in which zones affected by laser light are dissolved much faster than non-affected ones. This enables achieving cuts with aspect ration up to 1/50.


Find Patent Forward Citations

Mikutis, Mindaugas. (2025). Method and device for laser processing of transparent materials (U.S. Patent No. 12420356). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12420356

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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