The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Jan. 22, 2022
Cornell University, Ithaca, NY (US);
Ulrich B. Wiesner, Ithaca, NY (US);
Yusuke Hibi, Shizuoka, JP;
Cornell University, Ithaca, NY (US);
Abstract
Asymmetric films, methods of making asymmetric films, and uses of asymmetric films. A method may include using at least two different solvents and at least one homopolymer and at least one block copolymer that can undergo self assembly, where the solvents are immiscible and have different surface tension, where, on film formation, all or substantially all of the block copolymer(s) migrate to an exterior surface of the homopolymer. The asymmetric films may include an isoporous region or layer and an asymmetric region or layer, where the asymmetric region does not include 10 percent by weight or more of the multiblock copolymer(s) and/or the isoporous region/layer and the asymmetric pore region/layer are not independently (or separately) formed and/or not laminated together to form the asymmetric film. The films can be used in devices, such as, for example, filtration devices.