The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Aug. 23, 2023
Our United Corporation, Xi'an, CN;
Xikang Zhao, Xi'an, CN;
Yipeng Jing, Xi'an, CN;
OUR UNITED CORPORATION, Xi'an, CN;
Abstract
Provided is a method for generating an arc treatment plan. The method for generating the arc treatment plan includes: generating a plurality of sub-regions by partitioning a region of interest based on an irradiation duration corresponding to the region of interest in a target volume; and generating the arc treatment plan for the target volume based on the plurality of sub-regions and irradiation durations corresponding to the plurality of sub-regions; wherein the irradiation durations corresponding to the plurality of sub-regions are all less than or equal to a predetermined value, a sum of the irradiation durations corresponding to the plurality of sub-regions is equal to an irradiation duration corresponding to the region of interest, and irradiation positions corresponding to the plurality of sub-regions are the same as an irradiation position corresponding to the region of interest.