The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2025
Filed:
May. 08, 2023
David A. Borkholder, Canandaigua, NY (US);
Jing Ouyang, Scottsville, NY (US);
Denis R. Cormier, Pittsford, NY (US);
Ahmed Alfadhel, Rochester, NY (US);
David A. Borkholder, Canandaigua, NY (US);
Jing Ouyang, Scottsville, NY (US);
Denis R. Cormier, Pittsford, NY (US);
Ahmed Alfadhel, Rochester, NY (US);
Rochester Institute of Technology, Rochester, NY (US);
Abstract
Material properties are manipulated using rapid pulse application of energy in combination with applied electric or magnetic fields. When sintering, annealing or crystallizing a target film, the pulse repetition cycle can be constrained to ensure material temperature rises above and falls below the Curie temperature before the next energy pulse. This process results in enhanced material properties as compared to traditional techniques having a single, slow temperature excursion and subsequent application of the applied external field.