The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2025

Filed:

May. 08, 2023
Applicant:

Huawei Technologies Co., Ltd., Guangdong, CN;

Inventors:

Jianle Chen, San Diego, CA (US);

Anand Meher Kotra, Munich, DE;

Semih Esenlik, Munich, DE;

Biao Wang, Shenzhen, CN;

Han Gao, Shenzhen, CN;

Zhijie Zhao, Shenzhen, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 19/86 (2014.01); H04N 19/176 (2014.01); H04N 19/186 (2014.01); H04N 19/82 (2014.01); H04N 19/96 (2014.01);
U.S. Cl.
CPC ...
H04N 19/86 (2014.11); H04N 19/176 (2014.11); H04N 19/186 (2014.11); H04N 19/82 (2014.11); H04N 19/96 (2014.11);
Abstract

A method and image processing device are provided, including a deblocking filter. The deblocking filter modifies values of at most MA samples of the first image block as first filter output values, the at most MA samples being located at a column of the first image block that is perpendicular to and adjacent to the horizontal block edge; and modifies values of at most MB samples of the second image block as second filter output values, the at most MB samples being located at a column of the second image block that is perpendicular to and adjacent to the horizontal block edge. At most a number MA of sample values of the first image block adjacent to the block edge are modified and at most a number MB of sample values of the second image block adjacent to the block edge are modified, wherein MA<MB.


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