The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2025
Filed:
May. 14, 2022
Semes Co., Ltd., Chungcheongnam-do, KR;
Yoon Seok Choi, Gyeonggi-do, KR;
Soon Cheon Cho, Gyeonggi-do, KR;
Sang Jeong Lee, Gyeonggi-do, KR;
Hyun Woo Jo, Gyeonggi-do, KR;
Jong Won Park, Gyeonggi-do, KR;
SEMES CO., LTD., Chungcheongnam-do, KR;
Abstract
A plasma processing apparatus is provided. The plasma processing apparatus includes a chamber having a processing space defined therein in which plasma is generated; and a plasma generation unit configured to excite gas in the processing space into a plasma state, wherein the plasma generation unit includes: a first power supply to supply power for generation of the plasma; a coil connected to the first power supply; a first shunt capacitor disposed between and connected to a first node of the coil and a ground; and a second shunt capacitor disposed between and connected to a second node other than the first node of the coil and the ground.