The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2025
Filed:
Jan. 29, 2024
Microsoft Technology Licensing, Llc, Redmond, WA (US);
Andrew O. Hatch, Berkeley, CA (US);
Yan Wang, San Jose, CA (US);
Keqing Liang, Cupertino, CA (US);
Da Xu, Sunnyvale, CA (US);
Bixing Yan, Santa Clara, CA (US);
Haohua Wan, Sunnyvale, CA (US);
Microsoft Technology Licensing, LLC, Redmond, WA (US);
Abstract
Techniques for a social networking system involve analyzing members' interactions to enhance follow recommendations. The techniques include calculating the number of follows generated by a first member and the number of follows received by a second and third member. The platform then computes a weighted follow utility score for two member pairs: the first comprising the first and second members, and the second comprising the first and third members. These scores are determined by equally weighing the follows generated and received, along with a probability of the first member following the second or third member. While the probability suggests a preference for the second member, the ranking system places the third member pair higher. Consequently, the first member is advised to follow the third member, based on this ranking. Finally, this recommendation is displayed to the first member on an electronic device, guiding their social interactions on the platform.