The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2025

Filed:

May. 22, 2020
Applicant:

Nippon Electric Glass Co., Ltd., Otsu, JP;

Inventors:

Masahiro Hayashi, Otsu, JP;

Mayu Fujii, Otsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 3/093 (2006.01); C03B 17/06 (2006.01); C03B 25/12 (2006.01);
U.S. Cl.
CPC ...
C03C 3/093 (2013.01); C03B 17/064 (2013.01); C03B 25/12 (2013.01); C03C 2201/10 (2013.01); C03C 2201/32 (2013.01); C03C 2201/42 (2013.01); C03C 2201/54 (2013.01); C03C 2203/52 (2013.01);
Abstract

Provided is a method for producing a glass substrate that can reduce the dimensional change during heat treatment while avoiding shortening of facilities' service lives. A method for producing a glass substrate includes melting and forming a glass raw material to produce a glass substrate having a strain point of 690 to 750° C., wherein an average cooling rate in a temperature range from (an annealing point plus 150° C.) to (the annealing point minus 200° C.) in a cooling process during the forming is adjusted to 100 to 400° C./min to obtain the glass substrate having a degree of thermal contraction of 15 ppm or less when subjected to a heat treatment at 500° C. for an hour.


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