The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2025

Filed:

Sep. 24, 2020
Applicant:

Ngk Insulators, Ltd., Nagoya, JP;

Inventors:

Yoshimasa Kobayashi, Nagoya, JP;

Hiroharu Kobayashi, Kasugai-Shi, KR;

Assignee:

NGK INSULATORS, LTD., Nagoya, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 21/072 (2006.01); C30B 29/38 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C01B 21/0722 (2013.01); C01B 21/072 (2013.01); C30B 29/38 (2013.01); H01L 21/02389 (2013.01); H01L 21/02433 (2013.01); C01P 2002/74 (2013.01); C01P 2002/78 (2013.01); C01P 2006/80 (2013.01);
Abstract

An aluminum nitride plate satisfies both of a 'relation 1: c1>97.5%' and a “relation 2: c2/c1<0.995” where c1 is a c-plane degree of orientation that is defined as a ratio of a diffraction intensity of (002) plane to a sum of the diffraction intensity of (002) plane and a diffraction intensity of (100) plane when the surface layer of the aluminum nitride plate is subjected to an X-ray diffraction measurement, and c2 is a c-plane degree of (002) plane to the sum of the diffraction intensity of (002) plane and the diffraction intensity of (100) plane when a portion other than the surface layer of the aluminum nitride plate is subjected to the X-ray diffraction. Moreover, in the aluminum nitride plate, a difference in nitrogen content between the surface layer and the portion other than the surface layer is less than 0.15% in weight ratio.


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