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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12415235 B1

PDFFull Text
Date of Patent:
Sep. 16, 2025

Filed:

Jun. 12, 2022

Deposition mask manufacturing apparatus

Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Taekil Oh, Yongin-si, KR;

Gyoowan Han, Yongin-si, KR;

Wonyong Kim, Yongin-si, KR;

Seungho Myoung, Yongin-si, KR;

Jaeseok Park, Yongin-si, KR;

Alexander Voronov, Yongin-si, KR;

Jinhong Jeun, Yongin-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;

Attorney:

CANTOR COLBURN LLP

Primary Examiner:

John J Norton

Int. Cl.
CPC ...
B23K 26/362 (2014.01); B23K 26/06 (2014.01); B23K 26/067 (2006.01); B23K 26/082 (2014.01); B23K 26/382 (2014.01); C22C 38/08 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); H10K 71/00 (2023.01); H10K 71/16 (2023.01); B23K 103/02 (2006.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
B23K 26/362 (2013.01); B23K 26/0626 (2013.01); B23K 26/0673 (2013.01); B23K 26/0676 (2013.01); B23K 26/082 (2015.10); B23K 26/382 (2015.10); C22C 38/08 (2013.01); H01L 21/0275 (2013.01); H01L 21/0337 (2013.01); H10K 71/00 (2023.02); H10K 71/166 (2023.02); B23K 2103/02 (2018.08); G03F 1/00 (2013.01);
Abstract

An apparatus for manufacturing a deposition mask including a stage on which a mask substrate is mounted, a light source configured to irradiate a laser beam, a beam splitter configured to split the irradiated laser beam into a plurality of laser beams, a scanner configured to simultaneously scan the plurality of laser beams onto the mask substrate, and a tuner configured to finely change irradiation states of the plurality of laser beams to correspond to shapes of a plurality of pattern holes, while the plurality of laser beams are scanned.

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