The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2025

Filed:

Feb. 08, 2022
Applicant:

Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Wuhan, CN;

Inventors:

Jixiang Gong, Wuhan, CN;

Zhilin Yang, Wuhan, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10D 86/40 (2025.01); H10D 86/01 (2025.01); H10D 30/67 (2025.01); H10K 59/12 (2023.01); H10K 59/126 (2023.01); H10K 59/131 (2023.01);
U.S. Cl.
CPC ...
H10D 86/451 (2025.01); H10D 86/0231 (2025.01); H10D 86/441 (2025.01); H10D 86/471 (2025.01); H10D 30/6723 (2025.01); H10D 86/423 (2025.01); H10K 59/1201 (2023.02); H10K 59/126 (2023.02); H10K 59/131 (2023.02);
Abstract

A display panel and a method of manufacturing the same are provided. The display panel includes a shielding layer, a thin film transistor device layer, and a first via hole and a second via hole disposed correspondingly, and a third via hole disposed in a bonding area. Specifically, each of the first via hole and the third via hole is a stair-step shaped hole. The first via hole, the second via hole, and the third via hole are etched through a same etching process. Only one-time mask process is required, which saves number of masks and lowers the production cost.


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