The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2025

Filed:

Jun. 21, 2022
Applicant:

Lumentum Operations Llc, San Jose, CA (US);

Inventors:

Matthew Glenn Peters, Menlo Park, CA (US);

Jun Yang, Cupertino, CA (US);

Ajit Vijay Barve, San Jose, CA (US);

Guowei Zhao, Milpitas, CA (US);

Assignee:

Lumentum Operations LLC, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/00 (2006.01); H01S 5/183 (2006.01); H01S 5/30 (2006.01); H01S 5/323 (2006.01); H01S 5/34 (2006.01); H01S 5/042 (2006.01);
U.S. Cl.
CPC ...
H01S 5/3409 (2013.01); H01S 5/18311 (2013.01); H01S 5/18358 (2013.01); H01S 5/309 (2013.01); H01S 5/32366 (2013.01); H01S 5/3407 (2013.01); H01S 5/04252 (2019.08); H01S 5/18305 (2013.01); H01S 2304/02 (2013.01); H01S 2304/04 (2013.01);
Abstract

In some implementations, a method may include forming a quantum well (QW) layer using an epitaxial growth process, where the epitaxial growth process is performed according to a first growth mode to form the QW layer. The method may include forming a quantum well barrier (QWB) layer using the epitaxial growth process, where the epitaxial growth process is performed according to a second growth mode to form the QWB layer. In some implementations, a nitrogen flux used in the first growth mode is different from a nitrogen flux used in the second growth mode. In some implementations, a gallium flux used in the first growth mode is different from a gallium flux used in the second growth mode.


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