The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2025

Filed:

Nov. 04, 2022
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Gui Su Park, Chungcheongnam-do, KR;

Jun Young Choi, Chungcheongbuk-do, KR;

Young Jin Jang, Chungcheongnam-do, KR;

Yong Sun Ko, Gyeonggi-do, KR;

Kyu Hwan Chang, Chungcheongnam-do, KR;

Jun Hyun Lim, Seoul, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/08 (2006.01); B08B 13/00 (2006.01); F26B 5/00 (2006.01); G03F 7/20 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01); B25J 11/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67718 (2013.01); B08B 3/08 (2013.01); B08B 13/00 (2013.01); F26B 5/005 (2013.01); G03F 7/2043 (2013.01); H01L 21/68707 (2013.01); B25J 11/0095 (2013.01);
Abstract

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a first process treating unit configured to treat a substrate in a single-type method; a second process treating unit configured to treat a substrate in a batch-type method; and a posture changing unit provided between the first process treating unit and the second process treating unit and configured to change a posture of the substrate between a vertical posture and a horizontal posture, and wherein the substrate is loaded to and unloaded from the first process treating unit.


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