The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2025
Filed:
Oct. 15, 2020
Nec Corporation, Tokyo, JP;
Qiongqiong Wang, Tokyo, JP;
Takafumi Koshinaka, Tokyo, JP;
NEC CORPORATION, Tokyo, JP;
Abstract
A speech enhancement meansdetermines an enhancement mask generated based on a mask for speech enhancement, when a test utterance is input as speech data. A first hyper-parameter optimization meansdetermines, when the test utterance is input, a first hyper-parameter which is a hyper-parameter representing the degree to which the signal representing the test utterance is kept using the mask, and the first hyper-parameter which is set to take into account a downstream task that is processed using an enhanced test utterance. A mask generation meansgenerates an adaptive mask from the determined enhancement mask and the first hyper-parameter that enhances the test utterance for the downstream task. The mask generation meansgenerates the adaptive mask in which the first hyper-parameter is a power of the mask.