The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2025

Filed:

Sep. 08, 2020
Applicant:

Patek Philippe SA Geneve, Geneva, CH;

Inventor:

Jean-Luc Bucaille, Présilly, FR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G04B 17/32 (2006.01); C30B 29/06 (2006.01); C30B 29/66 (2006.01); C30B 33/08 (2006.01); G04B 17/06 (2006.01); G04B 21/06 (2006.01);
U.S. Cl.
CPC ...
G04B 17/32 (2013.01); C30B 29/06 (2013.01); C30B 29/66 (2013.01); G04B 17/06 (2013.01); C30B 33/08 (2013.01); F16F 2224/02 (2013.01); F16F 2226/04 (2013.01); F16F 2230/24 (2013.01); G04B 21/06 (2013.01);
Abstract

Disclosed is a method of making a timepiece spring from monocrystalline material including the following steps: drawing the spring; identifying one or more zones of weakness of the spring in which or in at least one of which the spring will break in the event of excessive deformation; manufacturing the spring from a wafer of monocrystalline material extending in a determined plane, while orienting the spring in the wafer such that the direction of the macroscopic stresses in the or each zone of weakness when the spring is deformed is substantially parallel to a plane of cleavage of the material intersecting the determined plane. Also disclosed is a timepiece spring obtained by such a method.


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