The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2025

Filed:

Nov. 30, 2021
Applicant:

Esko-graphics Imaging Gmbh, Itzehoe, DE;

Inventors:

Jörg Wolterink, Oelixdorf, DE;

Thomas Hänsel, Elmshorn, DE;

Christian Greve, Itzehoe, DE;

Frank Grewling, Breitenberg, DE;

Karsten Stubbe-Thierer, Itzehoe, DE;

Wolfgang Sievers, Kremperheide, DE;

Peter Morisse, Bornem, BE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); B41F 33/00 (2006.01); B41M 1/04 (2006.01); G06T 7/00 (2017.01); G06T 7/13 (2017.01); B41N 1/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2016 (2013.01); B41F 33/0009 (2013.01); B41M 1/04 (2013.01); G03F 7/2053 (2013.01); G06T 7/0004 (2013.01); G06T 7/13 (2017.01); B41N 1/12 (2013.01); G06T 2207/30144 (2013.01);
Abstract

Methods, systems, and non-transitory memory media embodying computer readable instructions for minimizing voids in front of a trailing edge of a solid rendition or linework print region printed using a photocurable flexographic printing plate having a printing surface corresponding to information in an image file. At least one solid rendition or linework image region corresponding to the solid rendition or linework print region has a pattern of 'on' and “off” single pixels that correspond to openings formed by an imager in a mask layer of the plate. Micro-screen openings in an edge region of the solid rendition or linework mask region are imaged with a different size than micro-screen openings in a center region of the solid rendition or linework mask region.


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