The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2025

Filed:

Feb. 03, 2023
Applicant:

Ciena Corporation, Hanover, MD (US);

Inventors:

Antoine Bois, Quebec, CA;

Raphael Beaupré-Laflamme, Quebec, CA;

Charles Baudot, Quebec, CA;

Assignee:

Ciena Corporation, Hanover, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/122 (2006.01); G02B 6/13 (2006.01);
U.S. Cl.
CPC ...
G02B 6/1228 (2013.01); G02B 6/13 (2013.01);
Abstract

An article comprises: one or more sets of lower index contrast layers, each comprising at least two materials having different indices of refraction, and configured to provide optical confinement based at least in part on a first numerical difference between the two indices of refraction; and one or more sets of higher index contrast layers, each comprising at least two materials having different indices of refraction, and configured to provide optical confinement based at least in part on a second numerical difference; and at least one optical coupler configured to optically couple a first of the one or more sets of lower index contrast layers to a first of the one or more sets of higher index contrast layers. The first numerical difference is smaller than the second numerical difference.


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