The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2025
Filed:
Nov. 26, 2021
Kojundo Chemical Laboratory Co., Ltd., Sakado, JP;
KOJUNDO CHEMICAL LABORATORY CO., LTD., Sakado, JP;
Abstract
Provided are a CVD source material used in production of a film containing indium and one or more of the other metals, which is stably preservable over the long term and easily handled, and a production method thereof. The CVD source material comprises ≥0.1 mol of one or more compounds of formulae (3) to (6) on the 100 mol basis of a compound of formula (1) or (2). In(CHR) . . . (1), In(C(CH)R) . . . (2), M(CHR) . . . (3), M(CHR). . . (4), M(C(CH)R) . . . (5), and M(C(CH)R). . . (6). In formulae (1) to (6), each R is independently hydrogen or an alkyl group having 1 to 6 carbons, in formulae (3) and (5), Mis a metal excluding indium, in formulae (4) and (6), Mis a metal excluding indium and n is an integer of 2 to 4.