The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2025
Filed:
Oct. 22, 2019
Linde Gmbh, Pullach, DE;
Pentapro Materials Inc., Taipei, TW;
Ce Ma, Apex, NC (US);
Atul Athalye, San Marcos, CA (US);
Carl Jackson, Thornton-Cleveleys Lancs, GB;
Kuochou Yeh, Hsinchu, TW;
Wen Che Kuo, Taipei, TW;
Ying Chieh Hu, Tainan, TW;
Linde GmbH, Pullach, DE;
Penta Pro Materials Inc., Taipei, TW;
Abstract
Systems and processes for gas phase-phase synthesis of trisilylamine. One system includes a reactor vessel having a top, bottom, and sidewall having an inner surface. The reactor vessel includes inlets for gaseous reactants, and a gas inlet for an inert gas. In certain reactors the gas inlets are positioned near the top of the reactor vessel and configured to inject the reactant gases in the reactor substantially vertically and downward therefrom. Other reactors are cyclonic-shaped with tangential feeding of the gases. One or more baffles having a peripheral edge and substantially horizontally positioned in the reactor to define a reaction zone above the baffles and a separation zone below the baffles. The baffles are positioned in the reactor vessel such that there is a gap between the baffle peripheral edge and the inner surface of the reactor vessel. Certain systems and processes include mechanical or static mixers.