The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2025
Filed:
Mar. 11, 2020
Heptagon Photonics Pte. Ltd., Singapore, SG;
Nicola Spring, Ziegelbrücke, CH;
Uros Markovic, Zurich, CH;
HEPTAGON PHOTONICS PTE. LTD., Singapore, SG;
Abstract
A method of manufacturing a plurality of optical elements includes providing a first wafer () having lower alignment features () arranged on a first surface of the substrate, providing a second wafer () comprising, on a replication side, a plurality of replication sections, each replication section defining a surface structure of one of the optical elements, the second wafer () further comprising upper alignment features () protruding, on the replication side, further than an outermost feature of the replication sections, depositing liquid droplets () on the first side of the first wafer (), and bringing the second wafer () and the first side of the first wafer () together, with liquid droplets () between the first wafer () and the second wafer (), the upper alignment features () contacting the liquid droplets () on the lower alignment features () on the first side of the first wafer (), and thereby causing the second wafer () to align with the first wafer () by capillary action.