The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2025

Filed:

Jun. 23, 2022
Applicant:

Lg Electronics Inc., Seoul, KR;

Inventors:

Sooyong Park, Seoul, KR;

Jinmoo Park, Seoul, KR;

Seonghun Lee, Seoul, KR;

Junchan Kwon, Seoul, KR;

Minsoo Kim, Seoul, KR;

Assignee:

LG ELECTRONICS INC., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04R 25/00 (2006.01); A61B 5/00 (2006.01); A62B 18/02 (2006.01);
U.S. Cl.
CPC ...
A61B 5/6843 (2013.01); A61B 5/6803 (2013.01); A61B 5/7264 (2013.01); A61B 5/741 (2013.01); A61B 5/746 (2013.01); A62B 18/025 (2013.01); A61B 2562/0247 (2013.01);
Abstract

Provided is a method for controlling a mask apparatus. The method for controlling the mask apparatus includes measuring a current pressure value with respect to a mask by using a pressure sensor, comparing each of a preset atmospheric pressure maximum estimation and a preset and a preset atmospheric pressure minimum estimation to the current pressure value; updating the atmospheric pressure maximum estimation and the atmospheric pressure minimum estimation according to the comparison result, and controlling a voice output of a speaker based on a difference between the updated atmospheric pressure maximum estimation and the updated atmospheric pressure minimum estimation.


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