The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2025
Filed:
Dec. 30, 2021
Fuji Electric Co., Ltd., Kawasaki, JP;
Masaki Miyazato, Matsumoto, JP;
Makoto Utsumi, Matsumoto, JP;
FUJI ELECTRIC CO., LTD., Kawasaki, JP;
Abstract
Back-surface roughness of a back surface of a silicon carbide semiconductor device having a MOS gate structure in a first region that is a region within 30 μm of a cross section (lateral surface) of the device is at most 4 μm while the back-surface roughness in a second region other than the first region is at most 2 μm, the back surface of the silicon carbide semiconductor device is the back surface of the second electrode. In a method of manufacture, the back-surface roughness of the device is specified to meet a predetermined condition. Then, ON voltages of the device before and after a forward current is passed through body diodes of the device are measured, and a rate of change of the ON voltage while the forward current is passed through body diodes is calculated, and then the device having a calculated rate of change less than 3% is identified.