The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2025

Filed:

Nov. 09, 2022
Applicant:

Richtek Technology Corporation, HsinChu, TW;

Inventors:

Chih-Wen Hsiung, Hsinchu, TW;

Wu-Te Weng, Hsinchu, TW;

Ta-Yung Yang, Taoyuan, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03F 3/217 (2006.01); H02M 3/335 (2006.01); H02M 7/219 (2006.01); H10D 30/01 (2025.01); H10D 30/60 (2025.01); H10D 30/65 (2025.01); H10D 62/17 (2025.01); H10D 64/27 (2025.01);
U.S. Cl.
CPC ...
H10D 30/65 (2025.01); H03F 3/2173 (2013.01); H10D 30/0221 (2025.01); H10D 30/603 (2025.01); H10D 62/393 (2025.01); H10D 64/516 (2025.01); H02M 3/33571 (2021.05); H02M 7/219 (2013.01);
Abstract

An NMOS half-bridge power device includes: a semiconductor layer, a plurality of insulation regions, a first N-type high voltage well and a second N-type high voltage well, which are formed by one same ion implantation process, a first P-type high voltage well and a second P-type high voltage well, which are formed by one same ion implantation process, a first drift oxide region and a second drift oxide region, which are formed by one same etch process including etching a drift oxide layer; a first gate and a second gate, which are formed by one same etch process including etching a poly silicon layer, a first P-type body region and a second P-type body region, which are formed by one same ion implantation process, a first N-type source and a first N-type drain, and a second N-type source and a second N-type drain.


Find Patent Forward Citations

Loading…