The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2025
Filed:
Sep. 30, 2021
International Business Machines Corporation, Armonk, NY (US);
Daniel Schmidt, Niskayuna, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
A method of characterizing asymmetric depositions on a target is provided. The method includes forming at least four asymmetrical petals in a layer on a substrate, and depositing a light-absorbing material on the at least four asymmetrical petals, wherein the light-absorbing material deposits unevenly on a plurality of walls of the at least four asymmetrical petals. The method further includes determining a pattern shift response (PSR) from the light-absorbing material on each of the walls of the at least four asymmetrical petals, and converting the pattern shift response (PSR) to an asymmetry of thicknesses of the light-absorbing material deposited on facing walls of the at least four asymmetrical petals. The method further includes correcting an overlay petal position based on the asymmetry of thicknesses.