The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2025
Filed:
Mar. 21, 2022
Inficon Ag, Balzers, LI;
Astrid Waldner, Bad Ragaz, CH;
Bernhard Andreaus, Rapperswil, CH;
Urs Wälchli, Chur, CH;
Stefan Kaiser, Ruggell, LI;
INFICON AG, Balzers, LI;
Abstract
The present invention relates to a device for plasma generation in a wide pressure range. The device comprises a first plasma source () in a first discharge chamber () in order to generate a first plasma in a low-pressure range, a second plasma source () in a second discharge chamber () in order to generate a second plasma in a high-pressure range, a first coupling element () for coupling the device to a system, in order to guide gas out of the system, and a second coupling element () for coupling the device to an optical sensor (). The first discharge chamber () has a first optical connection with at least one optical lens () to the second coupling element () and the second discharge chamber () has a second optical connection with at least one optical lens () to the second coupling element (). This invention further relates to a system for optical gas analysis or gas detection and corresponding methods for plasma generation and for operating the system.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile