The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2025
Filed:
Jun. 12, 2020
Hitachi High-tech Corporation, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
A dielectric microscopic observation is possible, which suppresses image flow regardless of scanning speed. There are provided a sample chamberholding a samplebetween a first insulating layeron which a conductive layerto be irradiated with a charged particle beam is laminated and a second insulating layer, an amplifierthat amplifies a potential change that occurs at an interface between the first insulating layer and the sample as the conductive layer is irradiated with the charged particle beam, and outputs the amplified result as a measurement signal, a main control unitthat converts the measurement signal from the amplifier into image data, and corrects the image data with a deconvolution filterto generate corrected image data, a display unitincluding an observation image display unitand a filter adjustment unitthat displays setting information of the deconvolution filter, and an information processing device that displays the corrected image data on the observation image display unit, and when the setting information of the deconvolution filter displayed in the filter adjustment unit is changed, adjusts the deconvolution filter according to the changed setting information.