The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2025

Filed:

Apr. 08, 2025
Applicant:

Ecopia Tech Corporation, Toronto, CA;

Inventors:

Yuanming Shu, Toronto, CA;

Shuo Tan, Campbell, CA (US);

Dawei Zai, Toronto, CA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/48 (2006.01); G06F 30/12 (2020.01); G06F 30/13 (2020.01);
U.S. Cl.
CPC ...
G06F 30/13 (2020.01); G06F 30/12 (2020.01);
Abstract

Methods and systems for generating geometric models of pitched roofs of buildings based on multiview imagery are provided. An example method involves establishing a three-dimensional coordinate space for the multiview imagery, displaying, through an annotation platform, multiview imagery depicting the pitched roof from different points of view, and providing, through the annotation platform, functionality for a user to define a perimeter of the pitched roof, define a ridge line of the pitched roof, and define at least part of a roof facet of the pitched roof by connecting the ridge line of the pitched roof to the perimeter of the pitched roof.


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