The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2025
Filed:
Jun. 08, 2022
Guangzhou China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Guangzhou, CN;
Yuxiu Zhang, Guangzhou, CN;
Hailong Wen, Guangzhou, CN;
Abstract
A method for fabricating a color filter includes: providing a substrate; forming a first photoresist material layer on the substrate; patterning the first photoresist material layer to form a plurality of first photoresists; forming a second photoresist material layer on the first photoresists and the substrate, wherein the second photoresist material layer comprises a plurality of dye molecules; and patterning the second photoresist material layer to form a plurality of second photoresists. The patterning the first photoresist material layer to form the first photoresists includes: controlling curing process parameters of the first photoresists to increase a density of the first photoresists, thereby preventing the dye molecules from entering the first photoresists.