The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2025
Filed:
Jun. 23, 2023
Santec Holdings Corporation, Aichi, JP;
Noboru Uehara, Aichi, JP;
SANTEC HOLDINGS CORPORATION, Aichi, JP;
Abstract
A substrate rotating apparatus includes a main rotation mechanism, an auxiliary rotation mechanism, and a guide structure. The main rotation mechanism rotates around a first rotation shaft. The main rotation mechanism includes the auxiliary rotation mechanism. The auxiliary rotation mechanism revolves about the first rotation shaft, and rotates around a second rotation shaft. The second rotation shaft is displaced in a circumferential direction with respect to a third rotation shaft provided between the first rotation shaft and the second rotation shaft. The guide structure has a contact surface extending in a circumferential direction with respect to the first rotation shaft. The guide structure controls displacement of the second rotation shaft in the circumferential direction with respect to the third rotation shaft, and causes the auxiliary rotation mechanism to perform the revolving motion in an orbit along the contact surface.