The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2025

Filed:

Sep. 03, 2020
Applicant:

Shin—etsu Chemical Co., Ltd., Tokyo, JP;

Inventor:

Shintaro Matsusue, Niigata, JP;

Assignee:
Primary Examiner:
Int. Cl.
CPC ...
C08L 1/28 (2006.01); A61K 9/48 (2006.01); C08J 5/18 (2006.01);
U.S. Cl.
CPC ...
C08L 1/284 (2013.01); A61K 9/4891 (2013.01); C08J 5/18 (2013.01); C08J 2301/28 (2013.01); C08L 2203/16 (2013.01);
Abstract

[Problems] A composition capable of forming a film having both good solubility and good strength, and the film are provided. [Solution] The composition includes first hydroxypropyl methyl cellulose (HPMC) polymer having a viscosity of 2.5-4.5 mPa·s, second HPMC polymer having 6.0-50.0 mPa·s, third HPMC polymer having 4.5-15.0 mPa·s, a gelling agent, and a solvent, each viscosity determined at 20° C. in a 2 mass % aqueous solution, wherein the first HPMC polymer is selected from three members: HPMC-IA in Group I and HPMC-IIA and HPMC-IIB in Group II, the second HPMC polymer is the same member as that of the first HPMC polymer, provided that DS (MS) of the second HPMC polymer may be the same as or different from the DS (MS) of the first HPMC polymer, and the third HPMC polymer is selected from a member or members in a Group different from the Group of the first HPMC polymer.


Find Patent Forward Citations

Matsusue, Shintaro. (2025). Film molding composition and film (U.S. Patent No. 12404390). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12404390

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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