The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2025

Filed:

Dec. 05, 2022
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventor:

Shotaro Kudo, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 12/00 (2025.01); H01L 21/02 (2006.01); H01L 21/3105 (2006.01); H01L 21/311 (2006.01); H01L 21/3205 (2006.01); H10D 12/01 (2025.01); H10D 62/13 (2025.01); H10D 62/17 (2025.01); H10D 64/01 (2025.01); H10D 64/23 (2025.01); H10D 64/66 (2025.01); H10D 64/68 (2025.01); H10D 89/60 (2025.01);
U.S. Cl.
CPC ...
H10D 12/441 (2025.01); H01L 21/02236 (2013.01); H01L 21/02271 (2013.01); H01L 21/31053 (2013.01); H01L 21/31111 (2013.01); H01L 21/32055 (2013.01); H10D 12/038 (2025.01); H10D 62/133 (2025.01); H10D 62/177 (2025.01); H10D 64/01 (2025.01); H10D 64/231 (2025.01); H10D 64/664 (2025.01); H10D 64/68 (2025.01); H10D 89/60 (2025.01);
Abstract

A semiconductor device includes an insulating layer (IFL) on a semiconductor substrate (SUB), a conductive film (PL) on the insulating layer (IFL), an interlayer insulating film (IL) covering the conductive film (PL), a contact hole (CH) in the interlayer insulating film (IL), the conductive film (PL) and the insulating layer (IFL), and a plug (PG) embedded in the contact hole (CH). A side surface of the interlayer insulating film (IL) is separated from a side surface of the conductive film (PL) to expose a part of an upper surface of the conductive film (PL), and a side surface of the insulating layer (IFL) is separated from the side surface of the conductive film (PL) to expose a part of a lower surface of the conductive film (PL). A distance (L) from the lower surface of the conductive film (PL) to the bottom of the contact hole (CH) is longer than a distance (L) from the side surface of the conductive film (PL) to the side surface of the interlayer insulating film (IL).


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