The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2025

Filed:

Mar. 19, 2019
Applicant:

Applied Materials Italia S.r.l., San Biagio di Callalta, IT;

Inventors:

Francesca Antoniolli, Oderzo, IT;

Marco D'acunzo, Quinto Di Treviso, IT;

Marco Galiazzo, Quinto Di Treviso, IT;

Daniel Hada, Cupertino, CA (US);

Assignee:

APPLIED MATERIALS ITALIA S.R.L., San Biagio di Callalta, IT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); C23C 14/04 (2006.01); C23C 14/50 (2006.01); H01L 21/027 (2006.01); H01L 21/768 (2006.01); H05K 3/12 (2006.01); H05K 3/18 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67712 (2013.01); C23C 14/042 (2013.01); C23C 14/50 (2013.01); H01L 21/027 (2013.01); H01L 21/768 (2013.01); H05K 3/1216 (2013.01); H05K 3/184 (2013.01); H05K 2203/1518 (2013.01);
Abstract

A deposition apparatus includes a first substrate support for supporting a substrate in a substantially vertical orientation. The substrate has a first main surface, a second main surface opposite the first main surface and a side surface between the first main surface and the second main surface. The deposition apparatus includes a first deposition device for depositing a first conductive pattern or a first resist mask on the side surface of the substrate while the substrate is supported in the substantially vertical orientation by the first substrate support.


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