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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12400879 B1

PDFFull Text
Date of Patent:
Aug. 26, 2025

Filed:

Oct. 26, 2022

Gas treatment system and gas treatment method using the same

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Wonsu Lee, Seoul, KR;

Kimoon Lee, Seoul, KR;

Seungjun Lee, Hwaseong-si, KR;

Jong San Chang, Suwon-si, KR;

Joungwoo Han, Suwon-si, KR;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;

Attorney:

Morgan, Lewis & Bockius LLP

Primary Examiner:

Robert A Hopkins

Int. Cl.
CPC ...
H01L 21/67 (2006.01); B01D 45/16 (2006.01); B01D 53/14 (2006.01); B01D 53/18 (2006.01); B01D 53/32 (2006.01); B01D 53/75 (2006.01); B01D 53/86 (2006.01); F23C 13/00 (2006.01); F23J 15/04 (2006.01); F23J 15/06 (2006.01); F23J 15/08 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67017 (2013.01); B01D 45/16 (2013.01); B01D 53/1406 (2013.01); B01D 53/1431 (2013.01); B01D 53/1493 (2013.01); B01D 53/18 (2013.01); B01D 53/32 (2013.01); B01D 53/75 (2013.01); B01D 53/869 (2013.01); F23C 13/00 (2013.01); F23J 15/04 (2013.01); F23J 15/06 (2013.01); F23J 15/08 (2013.01); H05H 1/2406 (2013.01); B01D 2252/103 (2013.01); B01D 2259/818 (2013.01); F23G 2202/60 (2013.01); F23G 2204/201 (2013.01); F23J 2219/40 (2013.01); H05H 2242/10 (2013.01); H05H 2245/17 (2021.05);
Abstract

A gas treatment system includes a first scrubber, a regenerative catalytic oxidizer (RCO) that treats gas that passes through the first scrubber, a second scrubber that treats the gas that passed through the regenerative catalytic oxidizer, and a dielectric barrier discharge (DBD) plasma reactor that treats the gas that passed through the second scrubber. The regenerative catalytic oxidizer includes a two-bed regenerative catalytic reactor.

Find Patent Forward Citations

Lee, Wonsu. (2025). Gas treatment system and gas treatment method using the same (U.S. Patent No. 12400879). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12400879

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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