The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2025

Filed:

Feb. 03, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Jaehyun Park, Suwon-si, KR;

Jingoo Lee, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32477 (2013.01); H01J 37/32513 (2013.01); H01J 37/32633 (2013.01); H01J 37/32642 (2013.01); H01L 21/02057 (2013.01); H01J 37/321 (2013.01); H01J 37/32743 (2013.01); H01J 2237/3342 (2013.01);
Abstract

A substrate process apparatus includes a chamber body providing a process space and a chamber lid coupled to the chamber body, the chamber lid includes a focus adapter providing a diffusion space of which width increases in a direction approaching a bottom of the focus adapter, a lid body surrounding the focus adapter, and a coupling adapter supporting the focus adapter, the lid body provides a coupling through hole recessed downwardly from an upper surface of the lid body, the coupling adapter provides a coupling recess recessed downwardly from an upper surface of the coupling adapter, and the coupling recess is spaced apart outwardly from the diffusion space and is located below the coupling through hole.


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