The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2025
Filed:
Jun. 16, 2023
Panasonic Intellectual Property Management Co., Ltd., Kadoma, JP;
Naoaki Takeda, Osaka, JP;
Abstract
Disclosed is a plasma processing apparatusincluding: a chamber; a high-frequency power sourceconfigured to supply a high-frequency power for generating plasma in the chamber; a matcher connected to the high-frequency power source; a distributorconnected to the matcherand configured to distribute and output the high-frequency power supplied from the high-frequency power source; a first coiland a second coilconnected in parallel with each other, on an output side of the distributor; and a control unitconfigured to change a distribution ratio of the high-frequency power distributed between the first coiland the second coil. The control unitchanges the distribution ratio after a reflected wave power in the matcheris made equal to or less than a first threshold by the matcher