The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2025

Filed:

Nov. 15, 2022
Applicant:

Derkwoo Semitech Co., Ltd., Seoul, KR;

Inventor:

Ki Bum Kim, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01); H01J 3/40 (2006.01);
U.S. Cl.
CPC ...
H01J 3/40 (2013.01); G03F 7/70866 (2013.01); G03F 7/70916 (2013.01);
Abstract

The present invention relates to a device designed to prevent fine particles produced in a vacuum system from being adsorbed to a semiconductor substrate and a sample or prevent the fine particles from being adsorbed to a mask in a lithography device using the vacuum system and, more specifically, to an extreme ultraviolet lithography device not using a membrane type pellicle. An embodiment of a particle transfer blocking device according to the present invention comprises: a vacuum chamber in which an accommodation part is formed; and a barrier module which is provided in the vacuum chamber and divides the accommodation part of the chamber into a first region and a second region, wherein the barrier module is not a physical barrier but an electrical potential barrier serving to prevent predetermined particles located in the first region from transferring to the second region.


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Kim, Ki. (2025). Particle transfer blocking device and lithography device using electron layer in vacuum system (U.S. Patent No. 12400822). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12400822

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