The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2025

Filed:

Jun. 23, 2023
Applicant:

Effect Photonics B.v., Eindhoven, NL;

Inventors:

Niall Patrick Kelly, Eindhoven, NL;

Irina Kulkova, Eindhoven, NL;

Tommaso Lunghi, Eindhoven, NL;

Assignee:

EFFECT PHOTONICS B.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/01 (2006.01);
U.S. Cl.
CPC ...
G02F 1/0142 (2021.01);
Abstract

A PIC that includes an InP-based polarization rotator having an improved design that enables at least one of an improved performance and an improved yield of the PIC due to at least one of reduced variations in critical dimensions of the InP-based polarization rotator and reduced overlay errors during fabrication of the InP-based polarization rotator of the PIC. An opto-electronic system including said PIC. A method of fabricating the PIC that includes the InP-based polarization rotator having the improved design.


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