The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2025

Filed:

Jul. 20, 2021
Applicant:

Hoya Lens Thailand Ltd., Pathumthani, TH;

Inventor:

Shohei Matsuoka, Tokyo, JP;

Assignee:

HOYA LENS THAILAND LTD., Pathumthani, TH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02C 7/06 (2006.01);
U.S. Cl.
CPC ...
G02C 7/06 (2013.01); G02C 2202/20 (2013.01);
Abstract

Provided are a spectacle lens and a technique associated therewith, wherein, when λ is a wavelength, r is a ratio of a total area of defocus regions to an overall area in plan view of a portion in which a plurality of defocus regions are provided in the spectacle lens, w is an amount of progression of a wavefront in each of the defocus regions relative to a base region, an average value of cos (2πw/λ) in one defocus region is obtained in each of the plurality of defocus regions, c(λ) is a gross average of the plurality of average values, an average value of sin (2πw/λ) in one defocus region is obtained in each of the plurality of defocus regions, s(λ) is a gross average of the plurality of average values, and f(λ) is equal to {1−r+r·c(λ)}+{s(λ)}, a sign of {f(λ×1.01)−f(λ)} is inverted at least once when the wavelength λ is increased within a range of 0.45 μm≤λ≤0.65 μm.


Find Patent Forward Citations

Loading…