The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2025
Filed:
Feb. 28, 2024
Illumina, Inc., San Diego, CA (US);
Illumina Cambridge Limited, Cambridge, GB;
Wayne N. George, Ilford, GB;
Alexandre Richez, Cambourne, GB;
M. Shane Bowen, Encinitas, CA (US);
Andrew A. Brown, Cambridge, GB;
Dajun Yuan, San Diego, CA (US);
Audrey Rose Zak, Carlsbad, CA (US);
Sean M. Ramirez, San Diego, CA (US);
Raymond Campos, Santee, CA (US);
Illumina, Inc., San Diego, CA (US);
Illumina Cambridge Limited, Cambridge, GB;
Abstract
An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.