The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2025
Filed:
Dec. 19, 2019
Group v element-containing film compositions and vapor deposition of group v element-containing film
Applicant:
L'air Liquide, Société Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;
Inventors:
Wontae Noh, Seoul, KR;
Jooho Lee, Seoul, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 1/00 (2006.01); C01G 33/00 (2006.01); C07F 17/00 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C09D 1/00 (2013.01); C01G 33/006 (2013.01); C07F 17/00 (2013.01); C23C 16/405 (2013.01); C23C 16/45536 (2013.01); C23C 16/45553 (2013.01); C01P 2004/03 (2013.01); C01P 2004/84 (2013.01);
Abstract
Methods for forming a Group V-containing film comprise: wherein M is a Group V (five) element selected from V, Nb, or Ta; R is H, Me, Et, nPr, iPr, nBu, sBu, iBu, tBu, n-pentyl, i-pentyl, neo-pentyl, or tert-amyl; each R, R, Ris independently H, an alkyl group, or a —SiR's group, with each R' independently being H or an alkyl group; and each R, R, R, R, Ris independently H, Me, Et, nPr, iPr, nBu, sBu, IBu, or tBu. Methods for deposition of a LiNbOfilm on a powder are disclosed.